High-Resolution Magnetic Force Microscopy Using Carbon Nanotube Probes Fabricated Directly by Microwave Plasma-Enhanced Chemical Vapor Deposition

<table>Plot of normalized
intensity of power spectrum at the various recording bit length. The solid line
was obtained by linear fitting for experimental plot. The sloping dashed line
was obtained by extrapolating of solid line. The
noise level was obtained from DC-erased area in (b)
MFM image.</table>

Journal of Nanomaterials

fig5

Figure 5

Figure 5: High-Resolution Magnetic Force Microscopy Using Carbon Nanotube Probes Fabricated Directly by Microwave Plasma-Enhanced Chemical Vapor Deposition 

Figure 5 | High-Resolution Magnetic Force Microscopy Using Carbon Nanotube Probes Fabricated Directly by Microwave Plasma-Enhanced Chemical Vapor Deposition 