Origin of the Difference in the Resistivity of As-Grown Focused-Ion- and Focused-Electron-Beam-Induced Pt Nanodeposits

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="936863.fig.007a" src="https://static.hindawi.com/articles/jnm/volume-2009/936863/figures/936863.fig.007a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>FIBID Pt deposit</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="936863.fig.007b" src="https://static.hindawi.com/articles/jnm/volume-2009/936863/figures/936863.fig.007b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>FEBID Pt deposit</td></tr></table></td></tr></table>

<table>HRTEM images obtained out of lamellae fabricated respectively from a Pt nanodeposit by (a) FIBID and (b) FEBID, in both cases grown at 5 kV beam energy.</table>

Journal of Nanomaterials

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Figure 7

Figure 7: Origin of the Difference in the Resistivity of As-Grown Focused-Ion- and Focused-Electron-Beam-Induced Pt Nanodeposits 