Research Article
Effect of Source, Surfactant, and Deposition Process on Electronic Properties of Nanotube Arrays
Table 2
Summary of results.
| SWNT Sources | Electrode spacing | Avg. length after deposition (in SEM) | DC resistance (1000’s of SWNTs in parallel) | On/off ratio |
| Cheap Tubes | 3 μm | >3 μm | <50 Ω | 2–8% | SWeNT | 1 μm | <1 μm | 50–100 Ω | 2–6% | CSI | 1 μm | <1.5 μm | 100–200 Ω | <1% | CNI/Unidym | 1 μm | <1 μm | 100–500 Ω | <1% | Las Alamos | 1 μm | <1.5 μm | 120–150 Ω | <1% | Nanointegris (semi-enriched, 90%) | 1 μm | <1.5 μm | 150–180 Ω | <1% |
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