Table 1:
Basic formulations and experimental ranges to prepare mold samples through the new dual dipping process.
Run number
SiO
2
precursor
Na
2
O precursor
Process
Condition of heat treatment
Run-1
TEOS
NaOMe
Process I
1000°C for 1 h
Run-2
PDMS
Run-3
TEOS
Process II
Run-4
PDMS