- About this Journal
- Abstracting and Indexing
- Aims and Scope
- Annual Issues
- Article Processing Charges
- Articles in Press
- Author Guidelines
- Bibliographic Information
- Citations to this Journal
- Contact Information
- Editorial Board
- Editorial Workflow
- Free eTOC Alerts
- Publication Ethics
- Reviewers Acknowledgment
- Submit a Manuscript
- Subscription Information
- Table of Contents
Journal of Nanomaterials
Volume 2012 (2012), Article ID 173825, 4 pages
doi:10.1155/2012/173825
Facile Synthesis of Porous-Structured Nickel Oxide Thin Film by Pulsed Laser Deposition
1Low Dimensional Materials Research Center, Department of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, Malaysia
2Department of Physics, Faculty of Science, University of Putra Malaysia, Selangor Darul Ehsan, Malaysia
3Department of Chemistry, Faculty of Science, University of Putra Malaysia, Selangor Darul Ehsan, Malaysia
4The Chancellery Building, Multimedia University, Persiaran Multimedia, Selangor Darul Ehsan 63100 Cyberjaya, Malaysia
5Department of physics, Islamic Azad University, Masjed-Soleiman Branch, Masjed-Soleiman 64917-96581, Iran
Received 24 July 2012; Revised 7 September 2012; Accepted 13 September 2012
Academic Editor: Zhenhui Kang
Copyright © 2012 Siamak Pilban Jahromi et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract
Porous-structured nickel oxide (PsNiO) was obtained through the oxidization of a nickel thin film. The nickel thin film was deposited using the pulsed laser deposition (PLD) method on a nickel foil as a substrate. The results show uniform PsNiO after the oxidization of the nickel thin film at 750∘C for 1 h. X-ray diffraction (XRD) indicates formation of the NiO crystalline structure. Field emission scanning electron microscopy (FESEM) reveals different morphology on the surface of the nickel foil (sample A) and on the nickel thin film (sample B). Comparison of the FESEM results after oxidization shows that the PsNiO on the nickel thin film was more regular and controllable than the NiO layer on the nickel foil. The FESEM images also show that the thickness of the nickel thin film affected the PsNiO size obtained after oxidization. This resulted from the growth of the porous structure at grain boundaries and from the grain sizes. The electrochemical properties of the PsNiO as an electrode are investigated by cyclic voltammetry (CV). These results show the effect of PsNiO size on the current of anodic peak.