Research Article

Optical and Structural Properties of Silicon Nanocrystals Embedded in SiOx Matrix Obtained by HWCVD

Figure 5

PL of S i O 𝑥 films grown at (a) 800°C, (b) 900°C, and (c) 1000°C.
368268.fig.005a
(a)
368268.fig.005b
(b)
368268.fig.005c
(c)