Fabrication of Highly Rough Ag Nanobud Substrates and Surface-Enhanced Raman Scattering of -DNA Molecules
Figure 1
Fabrication of AgNB structures by superionic conductor thin film. (a) Clean quartz substrate was placed in the deposition chamber at room temperature and 10−4 Pa vacuum. (b) 1 μm thick thin silver films were deposited on the quartz substrate as the electrodes. The distance between two electrodes was 8 cm. (c) 400 nm thick RbAg4I5 superionic conductor thin film was deposited on the whole substrate as the ion-conducting medium. (d) A constant electric current was provided as the external electric field to form a directional ionic current. Silver atoms at the anode were ionized and transported to the cathode to grow into AgNB structures through the RbAg4I5 thin film, while electrons were transported to the cathode through external conducting wires.
