Thermal Stability of Neodymium Aluminates High-<i>κ</i> Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors

<table>Leakage current density (<svg height="10.5125" id="M16" style="vertical-align:-0.15048pt" version="1.1" viewbox="0 0 10.4375 10.5125" width="10.4375" xmlns="http://www.w3.org/2000/svg">
<g transform="matrix(1.25,0,0,-1.25,0,10.5125)">
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<tspan style="font-size: 12.50px; " x="0" y="0">𝐽</tspan>
</text>
</g>
</g>
</svg>) versus electric field (Eox) applied across the NdAlO<i><sub>x</sub></i>/SiO<sub>2</sub> stacks as a function of PDA temperatures.  The NdAlO<i><sub>x</sub></i> films thickness was <svg height="15.275" id="M17" style="vertical-align:-5.04861pt" version="1.1" viewbox="0 0 39.087502 15.275" width="39.087502" xmlns="http://www.w3.org/2000/svg">
<g transform="matrix(1.25,0,0,-1.25,0,15.275)">
<g transform="translate(72,-59.78)">
<text transform="matrix(1,0,0,-1,-71.95,64.86)">
<tspan style="font-size: 12.50px; " x="0" y="0">𝑡</tspan>
</text>
<text transform="matrix(1,0,0,-1,-68.04,61.74)">
<tspan style="font-size: 8.75px; " x="0" y="0">h</tspan>
<tspan style="font-size: 8.75px; " x="4.3759999" y="0">i</tspan>
<tspan style="font-size: 8.75px; " x="6.8090558" y="0">g</tspan>
<tspan style="font-size: 8.75px; " x="11.185056" y="0">h</tspan>
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<text transform="matrix(1,0,0,-1,-52.48,61.74)">
<tspan style="font-size: 8.75px; " x="0" y="0">−</tspan>
<tspan style="font-size: 8.75px; " x="5.99512" y="0">𝜅</tspan>
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</svg> ~ 10.4 to 11 nm.</table>

Journal of Nanomaterials

fig4

Figure 4

Figure 4: Thermal Stability of Neodymium Aluminates High-<i>κ</i> Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors 

Figure 4 | Thermal Stability of Neodymium Aluminates High-κ Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors 