Nanoindentation and Adhesion Properties of Ta Thin Films

Figure 1

XRD results for Ta films at three conditions. (a) Deposited at RT only, (b) postannealing at 𝑇_𝐴 = 150°C for 1 h, and (c) postannealing at 𝑇_𝐴 = 250°C for 1 h.

(a)

(b)

(c)