Annealing Effect on the Thermoelectric Properties of Bi<sub>2</sub>Te<sub>3</sub> Thin Films Prepared by Thermal Evaporation Method

<table>XRD patterns of Bi<sub>2</sub>Te<sub>3</sub> thin films deposited at the substrate temperature of  150°C and annealed at various temperatures for 30 min in N<sub>2</sub> atmosphere.</table>

Journal of Nanomaterials

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Figure 2

Figure 2: Annealing Effect on the Thermoelectric Properties of Bi<sub>2</sub>Te<sub>3</sub> Thin Films Prepared by Thermal Evaporation Method 

Journal of Nanomaterials

Annealing Effect on the Thermoelectric Properties of Bi2Te3 Thin Films Prepared by Thermal Evaporation Method

Figure 2

Annealing Effect on the Thermoelectric Properties of Bi₂Te₃ Thin Films Prepared by Thermal Evaporation Method