Nucleation and Growth Mechanism of Si Amorphous Film Deposited by PIAD

Table 1

The height and the FWHM of the nuclei on the surface of the Si film with different thickness.

Thickness	2 nm	5 nm	10 nm
Height	1.4	3.7 nm	0.9
FWHM	106.05 nm	164.05 nm	75.77 nm