Surface Modification on the Sputtering-Deposited ZnO Layer for ZnO-Based Schottky Diode

<table><i>I</i>-<i>V</i> characteristics of the asdeposited cosputtered ITO-ZnO and ITO films contact to the <i>i</i>-ZnO layer as well as the annealed ITO-ZnO/<i>i</i>-ZnO contact system.</table>

Journal of Nanomaterials

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Figure 2

Figure 2: Surface Modification on the Sputtering-Deposited ZnO Layer for ZnO-Based Schottky Diode 