Directed Self-Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond
Figure 6
SEM images of guided sphere-forming PS-b-PDMS BCP patterns with a BCP patch (3.2 Td/in2) at three different magnifications. The BCP is directed by a 2-3 nm shallow imprint resist pattern (hcp) with a prepattern pitch (). The insets show 2D FFT graphs.
