Research Article

Understanding the Formation of the Self-Assembly of Colloidal Copper Nanoparticles by Surfactant: A Molecular Velcro

Figure 4

(a) XRD spectrum after 3 and 120 days with CTAB below the CMC shows the diffraction peaks of Cu2O, CuO, and Cu. (b) The absorbance spectrum below and above CMC.
802174.fig.004a
(a) ā€‰
802174.fig.004b
(b)