The Observation of Electrical Hysteric Behavior in Synthesized V₂O₅ Nanoplates by Recrystallization

Figure 3

SEM image of V₂O₅ foam annealed at (a) 250°C, (b) 300°C, (c) 350°C, and (d) 400°C. (e) XRD patterns of V₂O₅ foam dependent on annealing temperature.

(a)

(b)

(c)

(d)

(e)