Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate

<table>Raman spectrum of polymer redeposition. The locations of D-peak and G-peak are highlighted.</table>

Journal of Nanomaterials

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Figure 4

Figure 4: Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate 

Figure 4 | Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate 