Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate

<table>ATR FTIR spectrum of polymer redeposition.</table>

Journal of Nanomaterials

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Figure 5

Figure 5: Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate 

Figure 5 | Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate 