Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials

Figure 29

(a) SEM micrograph of a cross-section of the silicon tip arrays obtained by wet etching. The inset is the profile of water droplet on the sample. “Reproduced from [110] with permission of the Royal Society of Chemistry.” (b), (c) Respectively side and top SEM micrographs of RIE-etched silicon sample for antireflective applications. The scale bar is 200 nm. “Reprinted with permission from [113].” (d) SEM micrograph of silicon nanoimprint lithography stamp obtained by RIE etching. (e) SEM micrograph of corresponding imprinted pattern on PMMA. The scale bar is 200 nm. “Reprinted with permission from [124]. Copyright (2003) John Wiley and Sons.”