Study on the Microstructure and Electrical Properties of Boron and Sulfur Codoped Diamond Films Deposited Using Chemical Vapor Deposition
Figure 2
AFM image of the film deposited on a Si substrate with B-S codoping. The inset is a three-dimensional image. (a) S/C = 0.001, B/S = 0.01; (b) S/C = 0.005, B/S = 0.02.
