Review Article
An Overview on Structure and Field Emission Properties of Carbon Nitride Films
Table 2
Optimal sp
2/sp
3 ratio of amorphous carbon films which can be used as a reference of
films.
| | | ratio | Preparation method | Turn-on electric field () | Highest current density | Reference |
| | DLC films | 0.85–1.0 | Microwave plasma chemical vapor deposition (MPCVD) | 10 V/m (defined as the low-end electric field to emit electrons) | — | [28] | | a-C | 1.25 | MPCVD | 4.8 V/m (0.28 mA/cm2) | — | [29] | | Metal-DLC | 1.0 | Electrochemical deposition | 6.5 V/m (1 μA/cm2) | 1.2 mA/cm2 (23.5 V/m) | [30] | | Metal-DLC | 1.2016 | Electrochemical deposition | 8.4 V/m (1 μA/cm2) | 163.89 A/cm2 (12.455 V/m) | [31] |
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