An Overview on Structure and Field Emission Properties of Carbon Nitride Films

Table 4

Nitrogen content of the CN_𝑥 films.

	N content (at.%)	Preparation method	Turn-on electric field (𝐹𝑇)/threshold field (𝐹th)	Current density	Reference
a-C : N films	8.0	Electron cyclotron resonance plasma	—	—	[60]
ta-C : N	10	A pulsed filtered vacuum arc deposition	4 V/𝜇m (1×10^−6 A/cm^2)	—	[10]
DLC : N	10	Electrodeposition	11.8 V/𝜇m (1 𝜇A/mm^2)	59.5 𝜇A/mm^2 (24 V/𝜇m)	[61]
ta-C : N	10.3	Filtered cathodic vacuum arc deposition	—	—	[62]