Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering

Figure 7

AFM images of the TiCrN films deposited at various Ti sputtering currents of (a) 0.4, (b) 0.6, (c) 0.8, and (d) 1.0 A.

(a)

(b)

(c)

(d)