Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering

Table 5

Roughness and thickness of the TiCrN films as a function of Ti sputtering current.

𝐼Ti (A)	Roughness (nm)	Thickness (nm)
0.4	3.041	726
0.6	3.527	774
0.8	3.732	876
1.0	3.941	916