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Journal of Nanomaterials
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Journal of Nanomaterials
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2014
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Article
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Fig 2
/
Research Article
Resistive Switching Characteristics of a SiO
x
Layer with CF
4
Plasma Treatment
Figure 2
(a) Resistive switching behaviors of the control sample and (b) resistive switching behavior of the CF
4
-treated sample. Numbers and arrows denote the sequence.
(a)
(b)