Physicochemical Properties of Gold Nanostructures Deposited on Glass

Table 1

Element concentration from ARXPS measurement accomplished under different angles (0 and 81°) in gold nanostructures deposited on glass (SiO₂) after sputtering times 20 and 150 s and discharge currents 20 and 40 mA.

Sample	Element concentration (at. %)
	Si (2s)		C (1s)		O (1s)		Au (4f)
	Angle (°)
	0	81	0	81	0	81	0	81
SiO2	17.7	10.8	23.4	68.7	49.5	18.2	—	—
20 mA/20 s	11.9	1.8	34.1	58.3	31.5	3.6	22.5	36.3
/150 s	3.0	0.8	39.2	64.0	5.9	7.0	51.9	17.9
40 mA/20 s	—	—	53.5	68.8	11.8	10.4	34.7	20.8
/150 s	—	—	48.9	65.5	8.3	6.3	42.8	28.2