Substrate Temperature Effect on the Microstructure and Properties of (Si, Al)/a-C:H Films Prepared through Magnetron Sputtering Deposition

Figure 3

Plane-view TEM images taken from the bulk of the films deposited at different substrate temperatures (the insets of (a), (c), and (d) are inversely filtered FFT local images of the area marked by white squares): (a) 423 K, (b) 473 K, (c) 673 K, and (d) 773 K.

(a)

(b)

(c)

(d)