Ultra-Sensitive Colorimetric Plasmonic Sensing and Microfluidics for Biofluid Diagnostics Using Nanohole Array

Figure 3

Soft interference lithography. (a) Schematic showing the PEEL (photolithography, etching, electron-beam deposition, and lift-off of the film) process. (b) Optical image of master mold used in the PEEL process. The area of the mold is about 14 cm × 14 cm and it consists of array of Si post with diameter = 100 nm, height = 400 nm, and pitch = 400 nm. SEM image of the post is shown in the inset. (c) SEM image of the replicated nanohole array is from the master mold. Adapted from [89].

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