Research Article
Physical Properties of ZnO Thin Films Codoped with Titanium and Hydrogen Prepared by RF Magnetron Sputtering with Different Substrate Temperatures
Figure 4
XRD spectra of TZO thin films deposited with H2/(Ar + H2) flow ratio of (a) 0% and (b) 10% at various substrate temperatures and with various H2/(Ar + H2) flow ratios at (c) RT and (d) 300°C.
(a) H2 = 0% |
(b) H2 = 10% |
(c) RT |
(d) 300°C |