The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering

Table 2

The results of the Hall measurements of SnO₂ and ATO films annealed at different temperatures after being deposited at room temperature.

(°C)	SnO2					ATO
	Sample	(Ω·cm)	(cm^2V^−1s^−1)	(cm^−3)	Type	Sample	(Ω·cm)	(cm^2V^−1s^−1)	(cm^−3)	Type
RT	S1					A1
200	S7	17.11	2.51	−1.5 × 10^17	n	A7	4.50	0.65	−2.1 × 10^18	n
300	S8					A8	12.80	2.61	−1.8 × 10^17	n
400	S9					A9	71.80	0.81	1.1 × 10^17	p
500	S10					A10	30.60	1.72	1.2 × 10^17	p
550	S11	278	1.59	1.4 × 10^16	p	A11	0.83	1.73	4.4 × 10^18	p
600	S12	153	3.10	1.3 × 10^16	p	A12	4.20	2.90	5.1 × 10^17	p