Editorial Board

Editor-in-Chief

Michael Z. Hu, Oak Ridge National Laboratory, USA

Advisory Board

Taeghwan Hyeon, Seoul National University, Korea
James H. Adair, Pennsylvania State University, USA
C. Jeffrey Brinker, Sandia National Laboratory, USA
Nathan Lewis, California Institute of Technology, USA
Ed Ma, Worcester Polytechnic Institute, USA
Alon V Mccormick, University of Minnesota Minneapolis, USA
Gary L. Messing, Pennsylvania State University, USA
Zhonglin Wang, Georgia Institute of Technology, USA
Enge Wang, nese Academy of Sciences Institute of Physics, China
N. Xu, Nanjing University of Chemical Technology, China
Jackie Ying, Massachusetts Institute of Technology, USA

Associate Editors

Alan K. T. Lau, The Hong Kong Polytechnic University, Hong Kong
Xuedong Bai, Chinese Academy of Sciences, China
Donald A. Bansleben, Department of Homeland Security, USA
John Bartlett, ANSTO Materials & Engineering Science, Australia
Theodorian Borca-Tasciuc, Rensselaer Polytechnic Institute, USA
Christian Brosseau, Université de Bretagne Occidentale, France
Siu Wai Chan, Columbia University, USA
Sang-Hee Cho, Kyungpook National University, South Korea
Chun Xiang Cui, Hebei University of Technology, China
Ali Eftekhari, Materials and Energy Research Center, Iran
Claude Estournes, Institut Carnot CIRIMAT, France
Alan Fuchs, University of Nevada, Reno, USA
Lian Gao, Chinese Academy of Sciences, China
Hongcheng Gu, Shanghai Jiaotong University, China
Michael Harris, Purdue University, USA
Justin Holmes, University College Cork, Ireland
David Hui, University of New Orleans, USA
Wanqin Jin, Nanjing University of Technolog, China
Rakesh K. Joshi, University of South Florida , USA
Do Kyung Kim, Korea Advanced Institute of Science and Technology, South Korea
Burtrand I. Lee, Clemson University, USA
Jun Li, National University of Singapore, Singapore
S. J. Liao, South China University of Technology, China
Gong-Ru Lin, National Taiwan University, Taiwan
J. -Y. Liu, University of Missouri, St. Louis, USA
Jun Liu, Pacific Northwest National Laboratory, USA
Songwei Lu, PPG Industries, USA
Sanjay Mathur, University of Cologne, Germany
Nobuhiro Matsushita, Tokyo Institute of Technology, Japan
Sherine Obare, University of North Carolina at Charlotte, USA
P. Panine, European Synchrotron Radiation Facility, France
Donglu Shi, University of Cincinnati, USA
Bohua Sun, Cape Peninsula University of Technology, South Africa
Maryam Tabrizian, McGill University, Canada
Theodore T. Tsotsis, University of Southern California, USA
Y. Wang, Pacific Northwest National Lab, USA
Xiaogong Wang, Tsinghua University, China
Michael S. Wong, Rice University, USA
Ching Ping Wong, Georgia Institute of Technology, USA
Ping Xiao, University of Manchester, United Kingdom
Zhi-Li Xiao, Northern Illinois University, USA
Doron Yadlovker, RAFAEL Ltd, Israel
Kui Yu, National Research Council, Canada