Micro/Nanostructured Arrays: Fabrication, Applications and Devices

Call for Papers

In the last decades, ordered micro/nanostructured arrays have attracted much interest due to their important applications in field emitters, nanogenerators, sensors, microfluidic devices, optoelectronic devices, and so forth. The traditional methods to fabricate micro/nanostructured arrays are generally based on lithographic techniques (e.g., photolithography, electron beam lithography, ion beam lithography, X-ray lithography, etc.). However, they cannot be afforded due to the high costs and time consumtion in the most laboratories. Therefore, the scientists also endeavored to find other alternative strategies by facile routes with low costs, for instance, colloidal crystal template techniques, anodized aluminum oxide (AAO) templates, breath figure route, and so forth, further promoting the property investigation and device applications of ordered structured arrays. We invite authors to submit original research and review articles that focus on fabrication, property investigation of micro/nanostructured arrays, and their applications in devices. Potential topics include, but are not limited to:

• Micro/nanostructured arrays by traditional routes, that is, photolithography, electron beam lithography, and so forth
• Micro/nanostructured arrays by unconventional methods, that is, template techniques, figure breath route, self-assembly, microcontact printing, direct writing using focused electron beam-induced deposition (FEBID), use of lasers for fabrication arrays, and so forth
• Property investigation and device of micro/nanostructured arrays, that is, SERS, wettability, photocatalysis, photovoltaics, gas sensors, and so forth

Before submission authors should carefully read over the journal's Author Guidelines, which are located at http://www.hindawi.com/journals/jnm/guidelines/. Prospective authors should submit an electronic copy of their complete manuscript through the journal Manuscript Tracking System at http://mts.hindawi.com/ according to the following timetable:

Lead Guest Editor

• Yue Li, Institute of Solid State Physics, Chinese Academy of Sciences, Anhui, Hefei 230031, China

Guest Editors

• Bingqiang Cao, School of Materials Science and Engineering, University of Jinan, Shandong, Jinan 250022, China
• Fengqiang Sun, Department of Material Science and Engineering, South China Normal University, Guangdong, Guangzhou 510631, China
• Sung Oh Cho, Department of Nuclear and Quantum Engineering, Korea Advanced Institute of Science and Technology (KAIST), 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Republic of Korea