Structural, Nanomechanical, and Field Emission Properties of Amorphous Carbon Films Having Embedded Nanocrystallites Deposited by Filtered Anodic Jet Carbon Arc Technique

Table 2

Emission parameters evaluated in a-C:nc films deposited at different negative substrate biases.

Substrate bias/properties	0 V	−60 V	−150 V	−300 V
𝐸𝑇 (V/𝜇m)	9.4	11.0	13.5	14.1
𝐽max (mA/cm^2) at 20 V/𝜇m	0.6	0.2	0.07	0.04
Slope m of FN plots (V/𝜇m)	109.9	161.2	166.1	299.7
𝜑 (eV) (at 𝛽=1)	0.064	0.084	0.082	0.124
𝛽 (for 𝜑=5 eV)	694.4	473.7	459.8	254.8