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Journal of Nanotechnology
Volume 2012 (2012), Article ID 103439, 9 pages
http://dx.doi.org/10.1155/2012/103439
Research Article

Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting

1Department of Nanoscience and Nanoengineering, Waseda University, 3-4-1, Okubo, Shinjuku, Tokyo 169-8555, Japan
2Nano Processing System Division, Toshiba-Machine Co., Ltd., 2068-3 Ooka, Numazu, Shizuoka 410-8510, Japan
3Institute for Nanoscience and Nanotechnology, Waseda University, 513 Waseda Tsurumaki-cho, Shinjuku, Tokyo 162-0041, Japan

Received 25 November 2011; Accepted 14 July 2012

Academic Editor: Kyoung Moon

Copyright © 2012 Kentaro Ishibashi et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Kentaro Ishibashi, Hiroshi Goto, Jun Mizuno, and Shuichi Shoji, “Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting,” Journal of Nanotechnology, vol. 2012, Article ID 103439, 9 pages, 2012. doi:10.1155/2012/103439