Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting

<table>Distribution of press position: the flatness between the mold and the substrate was within 5 <i>μ</i>m, in a <svg height="11.075" id="M21" style="vertical-align:-0.3135pt" version="1.1" viewbox="0 0 63.962502 11.075" width="63.962502" xmlns="http://www.w3.org/2000/svg">
<g transform="matrix(1.25,0,0,-1.25,0,11.075)">
<g transform="translate(72,-63.14)">
<text transform="matrix(1,0,0,-1,-71.95,63.5)">
<tspan style="font-size: 12.50px; " x="0" y="0">1</tspan>
<tspan style="font-size: 12.50px; " x="6.2515001" y="0">3</tspan>
<tspan style="font-size: 12.50px; " x="12.503" y="0">0</tspan>
<tspan style="font-size: 12.50px; " x="21.530167" y="0">×</tspan>
<tspan style="font-size: 12.50px; " x="32.307751" y="0">1</tspan>
<tspan style="font-size: 12.50px; " x="38.559254" y="0">3</tspan>
<tspan style="font-size: 12.50px; " x="44.810753" y="0">0</tspan>
</text>
</g>
</g>
</svg> mm<sup>2</sup> area measured by step-and-repeat operation with the nanoimprinting system.</table>

Journal of Nanotechnology

Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting

Figure 3