Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting

Figure 7

Fabrication of 165 dies on a silicon substrate by step-and-repeat UV nanoimprinting under atmospheric pressure: (a) fabrication of 165 dies using high-viscosity resin (entire area), (b) fabrication of 165 dies using low-viscosity resin (entire area), (c) fabrication of 165 dies using high-viscosity resin, and (d) fabrication of 165 dies using low viscosity resin.

(a)

(b)

(c)

(d)