103439.fig.007a
(a)
103439.fig.007b
(b)
103439.fig.007c
(c)
103439.fig.007d
(d)
Figure 7: Fabrication of 165 dies on a silicon substrate by step-and-repeat UV nanoimprinting under atmospheric pressure: (a) fabrication of 165 dies using high-viscosity resin (entire area), (b) fabrication of 165 dies using low-viscosity resin (entire area), (c) fabrication of 165 dies using high-viscosity resin, and (d) fabrication of 165 dies using low viscosity resin.