Research Article

Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting

Table 2

Imprinting conditions.

Spin-coated resin thickness after baking120 nm
Photo-curable resin viscosity 12,000 mPa·s
Imprinting pressure2 MPa
Imprinting platen feed velocity 1 μm/s
Imprinting total UV light exposure
1-cycle UV light exposure time
360 mJ/cm2
12 s
RIE process gassesC4F8, SF6
RIE RF power500 W
RIE process time180 s