Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="561250.fig.0020a" src="https://static.hindawi.com/articles/jnt/volume-2012/561250/figures/561250.fig.0020a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>Topographic image of current</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="561250.fig.0020b" src="https://static.hindawi.com/articles/jnt/volume-2012/561250/figures/561250.fig.0020b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>Cross-section profile of current distribution</td></tr></table></td></tr></table>

<table>(a) Profile and cross-sectional images of current distribution and (b) model of current versus wear track for 4-nm-period (C/BN)n film at 3500 nN.</table>

Journal of Nanotechnology

fig20

Figure 20

Figure 20: Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering 