Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="561250.fig.004a" src="https://static.hindawi.com/articles/jnt/volume-2012/561250/figures/561250.fig.004a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>AES depth profile of multilayer film</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="561250.fig.004b" src="https://static.hindawi.com/articles/jnt/volume-2012/561250/figures/561250.fig.004b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b> Structure model</td></tr></table></td></tr><tr class="fig-image" id="c"><td><img alt="561250.fig.004c" src="https://static.hindawi.com/articles/jnt/volume-2012/561250/figures/561250.fig.004c.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(c) </b>TEM image</td></tr></table></td></tr></table>

<table>AES depth profile of multilayer film (a), model of multilayer film (b), and TEM image of nanoperiod multilayer film with a period of 8 nm (c).</table>

Journal of Nanotechnology

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Figure 4

Figure 4: Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering 