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Journal of Nanotechnology
Volume 2012 (2012), Article ID 635705, 6 pages
http://dx.doi.org/10.1155/2012/635705
Research Article

A Combined Ion Implantation/Nanosecond Laser Irradiation Approach towards Si Nanostructures Doping

1Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania, Italy
2MATIS, CNR, IMM, via S. Sofia 64, 95123 Catania, Italy
3Istituto per la Microelettronica e Microsistemi (CNR)-(IMM)—Consiglio Nazionale delle Ricerche VIII Strada 5, 95121 Catania, Italy
4Dipartimento di Fisica “A.Volta,” Università degli Studi di Pavia, via Bassi 6, 27100 Pavia, Italy

Received 28 September 2011; Accepted 23 November 2011

Academic Editor: Arturo I. Martinez

Copyright © 2012 F. Ruffino et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

F. Ruffino, L. Romano, E. Carria, et al., “A Combined Ion Implantation/Nanosecond Laser Irradiation Approach towards Si Nanostructures Doping,” Journal of Nanotechnology, vol. 2012, Article ID 635705, 6 pages, 2012. doi:10.1155/2012/635705