102404.fig.0014a
(a) Line pitch 500 nm
102404.fig.0014b
(b) Line pitch 400 nm
102404.fig.0014c
(c) Line pitch 300 nm
102404.fig.0014d
(d) Line pitch 200 nm
Figure 14: AFM profiles of evenly interspaced lines mechanochemically processed by tip sliding on silicon before and after etching with 10% KOH solution.