102404.fig.0015a
(a) Before processing
102404.fig.0015b
(b) First processing at higher load
102404.fig.0015c
(c) Second processing at lower load
Figure 15: Model of a nanofabrication process using mechanochemically and naturally oxidized areas as etching masks. (a) Before processing, (b) during the first processing step at high load, and (c) during the second processing step at low load.