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Journal of Nanotechnology
Volume 2014 (2014), Article ID 170415, 26 pages
http://dx.doi.org/10.1155/2014/170415
Review Article

Direct-Write Ion Beam Lithography

1Independent, Richardson, TX 75081, USA
2Raith GmbH, Konrad-Adenauer-Allee 8, Phoenix West, 44263 Dortmund, Germany

Received 23 July 2013; Revised 22 October 2013; Accepted 27 October 2013; Published 10 February 2014

Academic Editor: Paresh Chandra Ray

Copyright © 2014 Alexandra Joshi-Imre and Sven Bauerdick. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. F. Watt, A. A. Bettiol, J. A. Van Kan, E. J. Teo, and M. B. H. Breese, “Ion beam lithography and nanofabrication: a review,” International Journal of Nanoscience, vol. 4, no. 3, pp. 269–286, 2005. View at Publisher · View at Google Scholar · View at Scopus
  2. H. D. Wanzenboeck and S. Waid, “Focused ion beam lithography,” in Recent Advances in Nanofabrication Techniques and Applications, B. Cui, Ed., InTech, Rijeka, Croatia, 2011. View at Publisher · View at Google Scholar
  3. L. A. Giannuzzi and F. A. Stevie, Introduction to Focused Ion Beams: Instrumentation, Theory, Techniques and Practice, Springer, Boston, Mass, USA, 2005.
  4. J. F. Ziegler, M. D. Ziegler, and J. P. Biersack, “SRIM—the stopping and range of ions in matter (2010),” Nuclear Instruments and Methods in Physics Research B, vol. 268, no. 11-12, pp. 1818–1823, 2010. View at Publisher · View at Google Scholar · View at Scopus
  5. J. F. Ziegler, J. P. Biersack, and M. D. Ziegler, SRIM: The Stopping and Range of Ions in Matter, LuLu Press, 2008.
  6. C. A. Volkert and A. M. Minor, “Focused ion beam microscopy and micromachining,” Materials Research Society Bulletin, vol. 32, no. 5, pp. 389–399, 2007. View at Publisher · View at Google Scholar
  7. J. Orloff, M. Utlaut, and L. Swanson, High Resolution Focused Ion Beams: FIB and Its Applications, Kluwer Academic/Plenum Publishers, New York, NY, USA, 2003.
  8. H. H. Andersen and H. L. Bay, “Sputtering yield measurements,” in Sputtering by Particle Bombardment I, vol. 47 of Topics in Applied Physics, pp. 145–218, 1981. View at Publisher · View at Google Scholar
  9. J. Gierak, “Focused ion beam technology and ultimate applications, topical review,” Semiconductor Science and Technology, vol. 24, no. 4, Article ID 043001, 2009. View at Publisher · View at Google Scholar · View at Scopus
  10. A. A. Tseng, “Recent developments in nanofabrication using focused ion beams,” Small, vol. 1, no. 10, pp. 924–939, 2005. View at Publisher · View at Google Scholar · View at Scopus
  11. O. Wilhelmi and J. J. L. Mulders, “Focused ion beam and dualbeam technology applied to nanoprototyping,” in Nanofabrication Using Focused Ion and Electron Beams Principles and Applications, I. Utke, S. Moshkalev, and P. Russell, Eds., Oxford University Press, New York, NY, USA, 2012.
  12. S. Tan, R. Livengood, Y. Greenzweig, Y. Drezner, and D. Shima, “Probe current distribution characterization technique for focused ion beam,” Journal of Vacuum Science & Technology B, vol. 30, no. 6, p. 06F606, 2012. View at Publisher · View at Google Scholar
  13. G. B. Assayag, C. Vieu, J. Gierak, P. Sudraud, and A. Corbin, “New characterization method of ion current-density profile based on damage distribution of Ga+ focused-ion beam implantation in GaAs,” Journal of Vacuum Science & Technology B, vol. 11, p. 2420, 1993. View at Publisher · View at Google Scholar
  14. J. Orloff, “High-resolution focused ion beams,” Review of Scientific Instruments, vol. 64, no. 5, pp. 1105–1130, 1993. View at Publisher · View at Google Scholar · View at Scopus
  15. J. Orloff, L. W. Swanson, M. Utlaut, et al., “Fundamental limits to imaging resolution for focused ion beams,” Journal of Vacuum Science & Technology B, vol. 14, no. 6, pp. 3759–3763, 1996. View at Scopus
  16. B. Schmidt, L. Bischoff, J. Teichert, et al., “Writing FIB implantation and subsequent anisotropic wet chemical etching for fabrication of 3D structures in silicon,” Sensors and Actuators A, vol. 61, no. 1–3, pp. 369–373, 1997. View at Publisher · View at Google Scholar · View at Scopus
  17. J. Gierak, A. Madouri, A. L. Biance et al., “Sub-5 nm FIB direct patterning of nanodevices,” Microelectronic Engineering, vol. 84, no. 5–8, pp. 779–783, 2007. View at Publisher · View at Google Scholar · View at Scopus
  18. R. L. Seliger and W. P. Fleming, “Focused ion beams in microfabrication,” Journal of Applied Physics, vol. 45, no. 3, pp. 1416–1422, 1974. View at Publisher · View at Google Scholar · View at Scopus
  19. J. Melngailis, “Focused ion beam technology and applications,” Journal of Vacuum Science & Technology B, vol. 5, no. 2, pp. 469–495, 1987. View at Publisher · View at Google Scholar
  20. J. Orloff, Handbook of Charged Particle Optics, Taylor & Francis Group, Boca Raton, Fla, USA, 2nd edition, 2009.
  21. J. J. Van Es, J. Gierak, R. G. Forbes et al., “An improved gallium liquid metal ion source geometry for nanotechnology,” Microelectronic Engineering, vol. 73-74, pp. 132–138, 2004. View at Publisher · View at Google Scholar · View at Scopus
  22. L. Bischoff, “Application of mass-separated focused ion beams in nano-technology,” Nuclear Instruments and Methods in Physics Research B, vol. 266, no. 8, pp. 1846–1851, 2008. View at Publisher · View at Google Scholar · View at Scopus
  23. B. R. Appleton, S. Tongay, M. Lemaitre et al., “Materials modifications using a multi-ion beam processing and lithography system,” Nuclear Instruments and Methods in Physics Research B, vol. 272, pp. 153–157, 2012. View at Publisher · View at Google Scholar · View at Scopus
  24. J. Gierak, A. Madouri, E. Bourhis, L. Travers, D. Lucot, and J. C. Harmand, “Focused gold ions beam for localized epitaxy of semiconductor nanowires,” Microelectronic Engineering, vol. 87, no. 5–8, pp. 1386–1390, 2010. View at Publisher · View at Google Scholar · View at Scopus
  25. D. Winston, B. M. Cord, B. Ming et al., “Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist,” Journal of Vacuum Science & Technology B, vol. 27, no. 6, pp. 2702–2706, 2009. View at Publisher · View at Google Scholar · View at Scopus
  26. V. Sidorkin, E. Van Veldhoven, E. Van Der Drift, P. Alkemade, H. Salemink, and D. Maas, “Sub-10-nm nanolithography with a scanning helium beam,” Journal of Vacuum Science & Technology B, vol. 27, no. 4, pp. L18–L20, 2009. View at Publisher · View at Google Scholar · View at Scopus
  27. W.-D. Li, W. Wu, and R. S. Williams, “Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns,” Journal of Vacuum Science & Technology B, vol. 30, no. 6, article 06F304, 2012. View at Publisher · View at Google Scholar
  28. D. Winston, V. R. Manfrinato, S. M. Nicaise et al., “Neon ion beam lithography,” Nano Letters, vol. 11, no. 10, pp. 4343–4347, 2011. View at Publisher · View at Google Scholar · View at Scopus
  29. N. S. Smith, W. P. Skoczylas, S. M. Kellogg et al., “High brightness inductively coupled plasma source for high current focused ion beam applications,” Journal of Vacuum Science & Technology B, vol. 24, no. 6, pp. 2902–2906, 2006. View at Publisher · View at Google Scholar · View at Scopus
  30. C. E. Otis, A. Graupera, D. Laur, S. Zhang, S. Kellogg, and G. Schwind, “Mass filtered plasma focused ion beam system,” Journal of Vacuum Science & Technology B, vol. 30, no. 6, article 06F604, 2012. View at Publisher · View at Google Scholar
  31. J. L. Hanssen, E. A. Dakin, J. J. McClelland, and M. Jacka, “Using laser-cooled atoms as a focused ion beam source,” Journal of Vacuum Science & Technology B, vol. 24, no. 6, pp. 2907–2910, 2006. View at Publisher · View at Google Scholar · View at Scopus
  32. A. V. Steele, B. Knuffman, J. J. McClelland, and J. Orloff, “Focused chromium ion beam,” Journal of Vacuum Science & Technology B, vol. 28, no. 6, article C6F1, 2010. View at Publisher · View at Google Scholar · View at Scopus
  33. F. Ullmann, F. Grossmann, V. P. Ovsyannikov et al., “Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap,” Journal of Vacuum Science & Technology B, vol. 25, no. 6, pp. 2162–2167, 2007. View at Publisher · View at Google Scholar · View at Scopus
  34. R. Livengood, S. Tan, Y. Greenzweig, J. Notte, and S. McVey, “Subsurface damage from helium ions as a function of dose, beam energy, and dose rate,” Journal of Vacuum Science & Technology B, vol. 27, no. 6, pp. 3244–3249, 2009. View at Publisher · View at Google Scholar · View at Scopus
  35. A. Imre, L. E. Ocola, L. Rich, and J. Klingfus, “Large area direct-write focused ion-beam lithography with a dual-beam microscope,” Journal of Vacuum Science & Technology B, vol. 28, no. 2, pp. 304–309, 2010. View at Publisher · View at Google Scholar · View at Scopus
  36. A. A. Tseng, “Recent developments in micromilling using focused ion beam technology,” Journal of Micromechanics and Microengineering, vol. 14, no. 4, pp. R15–R34, 2004. View at Publisher · View at Google Scholar · View at Scopus
  37. I. Utke, P. Hoffmann, and J. Melngailis, “Gas-assisted focused electron beam and ion beam processing and fabrication,” Journal of Vacuum Science & Technology B, vol. 26, no. 4, pp. 1197–1276, 2008. View at Publisher · View at Google Scholar · View at Scopus
  38. R. M. Langford, “Focused ion beam nanof abri cat ion: a comparison with conventional processing techniques,” Journal of Nanoscience and Nanotechnology, vol. 6, no. 3, pp. 661–668, 2006. View at Publisher · View at Google Scholar · View at Scopus
  39. J. Gierak, E. Bourhis, G. Faini et al., “Exploration of the ultimate patterning potential achievable with focused ion beams,” Ultramicroscopy, vol. 109, no. 5, pp. 457–462, 2009. View at Publisher · View at Google Scholar · View at Scopus
  40. V. Repain, J.-P. Jamet, N. Vernier et al., “Magnetic interactions in dot arrays with perpendicular anisotropy,” Journal of Applied Physics, vol. 95, no. 5, pp. 2614–2618, 2004. View at Publisher · View at Google Scholar · View at Scopus
  41. J. Gierak, D. Mailly, P. Hawkes et al., “Exploration of the ultimate patterning potential achievable with high resolution focused ion beams,” Applied Physics A, vol. 80, no. 1, pp. 187–194, 2005. View at Publisher · View at Google Scholar · View at Scopus
  42. R. Hull, J. A. Floro, M. Gherasimova et al., “Bridging the length scales between lithographic patterning and self assembly mechanisms in fabrication of semiconductor nanostructure arrays,” Journal of Physics, vol. 209, Article ID 012003, 2010. View at Publisher · View at Google Scholar · View at Scopus
  43. F. Ghaleh, R. Köster, H. Hövel et al., “Controlled fabrication of nanopit patterns on a graphite surface using focused ion beams and oxidation,” Journal of Applied Physics, vol. 101, no. 4, Article ID 044301, 2007. View at Publisher · View at Google Scholar · View at Scopus
  44. P. Mélinon, A. Hannour, L. Bardotti et al., “Ion beam nanopatterning in graphite: characterization of single extended defects,” Nanotechnology, vol. 19, no. 23, Article ID 235305, 2008. View at Publisher · View at Google Scholar · View at Scopus
  45. B. Prével, L. Bardotti, S. Fanget et al., “Gold nanoparticle arrays on graphite surfaces,” Applied Surface Science, vol. 226, no. 1–3, pp. 173–177, 2004. View at Publisher · View at Google Scholar · View at Scopus
  46. A. Hannour, L. Bardotti, B. Prével et al., “2D arrays of CoPt nanocluster assemblies,” Surface Science, vol. 594, no. 1–3, pp. 1–11, 2005. View at Publisher · View at Google Scholar · View at Scopus
  47. I. C. Marcus, I. Berbezier, A. Ronda et al., “In-plane epitaxial growth of self-assembled ge nanowires on Si substrates patterned by a focused ion beam,” Crystal Growth & Design, vol. 11, no. 7, pp. 3190–3197, 2011. View at Publisher · View at Google Scholar · View at Scopus
  48. C. Uzan-Saguy, C. Cytermann, R. Brener, V. Richter, M. Shaanan, and R. Kalish, “Damage threshold for ion-beam induced graphitization of diamond,” Applied Physics Letters, vol. 67, p. 1194, 1995. View at Publisher · View at Google Scholar · View at Scopus
  49. N. R. Parikh, J. D. Hunn, E. McGucken et al., “Single-crystal diamond plate liftoff achieved by ion implantation and subsequent annealing,” Applied Physics Letters, vol. 61, no. 26, pp. 3124–3126, 1992. View at Publisher · View at Google Scholar · View at Scopus
  50. P. Olivero, S. Rubanov, P. Reichart et al., “Ion-beam-assisted lift-off technique for three-dimensional micromachining of freestanding single-crystal diamond,” Advanced Materials, vol. 17, no. 20, pp. 2427–2430, 2005. View at Publisher · View at Google Scholar · View at Scopus
  51. T. N. T. Thi, B. Fernandez, D. Eon et al., “Ultra-smooth single crystal diamond surfaces resulting from implantation and lift-off processes,” Physica Status Solidi A, vol. 208, no. 9, pp. 2057–2061, 2011. View at Publisher · View at Google Scholar · View at Scopus
  52. S. Rubanov and A. Suvorova, “Ion implantation in diamond using 30 keV Ga+ focused ion beam,” Diamond and Related Materials, vol. 20, no. 8, pp. 1160–1164, 2011. View at Publisher · View at Google Scholar · View at Scopus
  53. W. R. McKenzie, M. Z. Quadir, M. H. Gass, and P. R. Munroe, “Focused ion beam implantation of diamond,” Diamond and Related Materials, vol. 20, no. 8, pp. 1125–1128, 2011. View at Publisher · View at Google Scholar · View at Scopus
  54. A. M. Zaitsev, “Carbon nanowires made on diamond surface by focused ion beam,” Physica Status Solidi A, vol. 202, no. 10, pp. R116–R118, 2005. View at Publisher · View at Google Scholar · View at Scopus
  55. M. A. Draganski, E. Finkman, B. C. Gibson, B. A. Fairchild, and K. Ganesan, “Tailoring the optical constants of diamond by ion implantation,” Optical Materials Express, vol. 2, no. 5, pp. 644–649, 2012. View at Publisher · View at Google Scholar
  56. S. Tongay, M. Lemaitre, J. Fridmann, A. F. Hebard, B. P. Gila, and B. R. Appleton, “Drawing graphene nanoribbons on SiC by ion implantation,” Applied Physics Letters, vol. 100, no. 7, Article ID 073501, 2012. View at Publisher · View at Google Scholar · View at Scopus
  57. M. G. Lemaitre, “Low-temperature, site selective graphitization of SiC via ion implantation and pulsed laser annealing,” Applied Physics Letters, vol. 100, Article ID 193105, 2012. View at Publisher · View at Google Scholar
  58. R. L. Kubena, J. W. Ward, F. P. Stratton, R. J. Joyce, and G. M. Atkinson, “A low magnification focused ion beam system with 8 nm spot size,” Journal of Vacuum Science & Technology B, vol. 9, no. 6, pp. 3079–3083, 1991.
  59. L. Bruchhaus, S. Bauerdick, L. Peto, U. Barth, A. Rudzinski, and J. Mussmann, “High resolution and high density ion beam lithography employing HSQ resist,” Microelectronic Engineering, vol. 97, pp. 48–50, 2012. View at Publisher · View at Google Scholar
  60. S. Matsui, Y. Kojima, Y. Ochiai, and T. Honda, “High-resolution focused ion beam lithography,” Journal of Vacuum Science & Technology B, vol. 9, no. 5, p. 2622, 1991. View at Publisher · View at Google Scholar
  61. K. Arshak, M. Mihov, A. Arshak, D. McDonagh, and D. Sutton, “Focused ion beam lithography-overview and new approaches,” in Proceedings of the 24th International Conference on Microelectronics (MIEL '04), vol. 2, pp. 459–462, Niš, Serbia, May 2004. View at Publisher · View at Google Scholar
  62. K. Arshak, M. Mihov, S. Nakahara, A. Arshak, and D. McDonagh, “A novel focused-ion-beam lithography process for sub-100 nanometer technology nodes,” Superlattices and Microstructures, vol. 36, no. 1–3, pp. 335–343, 2004. View at Publisher · View at Google Scholar · View at Scopus
  63. K. Arshak, S. F. Gilmartin, D. Collins, O. Korostynska, A. Arshak, and M. Mihov, “Ion beam lithography and resist processing for nanofabrication,” in Proceedings of the Materials Research Society Symposium, vol. 983, pp. 0983-LL01–0983-LL02, Boston, Mass, USA, December 2006.
  64. J. Xu and A. J. Steckl, “Fabrication of visibly photoluminescent Si microstructures by focused ion beam implantation and wet etching,” Applied Physics Letters, vol. 65, no. 16, pp. 2081–2083, 1994. View at Publisher · View at Google Scholar · View at Scopus
  65. N. Chekurov, K. Grigoras, A. Peltonen, S. Franssila, and I. Tittonen, “The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching,” Nanotechnology, vol. 20, no. 6, Article ID 065307, 2009. View at Publisher · View at Google Scholar · View at Scopus
  66. M. D. Henry, M. J. Shearn, B. Chhim, and A. Scherer, “Ga+ beam lithography for nanoscale silicon reactive ion etching,” Nanotechnology, vol. 21, no. 24, Article ID 245303, 2010. View at Publisher · View at Google Scholar · View at Scopus
  67. W. McKenzie, J. Pethica, and G. Cross, “A direct-write, resistless hard mask for rapid nanoscale patterning of diamond,” Diamond and Related Materials, vol. 20, no. 5-6, pp. 707–710, 2011. View at Publisher · View at Google Scholar · View at Scopus
  68. S. K. Tripathi, D. Scanlan, N. O'Hara et al., “Resolution, masking capability and throughput for direct-write, ion implant mask patterning of diamond surfaces using ion beam lithography,” Journal of Micromechanics and Microengineering, vol. 22, no. 5, Article ID 055005, 2012. View at Publisher · View at Google Scholar · View at Scopus
  69. H.-Y. Lee and H.-B. Chung, “Ga+ focused-ion-beam exposure and CF4 reactive-ion-etching development of Si3N4 resist optimized by Monte Carlo simulation,” Journal of Vacuum Science & Technology B, vol. 16, pp. 1161–1166, 1998. View at Publisher · View at Google Scholar
  70. H.-Y. Lee and H.-B. Chung, “Dry-etching development characteristics of Se75Ge25 resist for focused-ion-beam lithography,” Journal of Vacuum Science & Technology B, vol. 16, no. 4, pp. 1987–1991, 1998. View at Publisher · View at Google Scholar · View at Scopus
  71. A. Plech, P. Leiderer, and J. Boneberg, “Femtosecond laser near field ablation,” Laser & Photonics Reviews, vol. 3, no. 5, pp. 435–451, 2009. View at Publisher · View at Google Scholar · View at Scopus
  72. M. Deubel, G. von Freymann, M. Wegener, S. Pereira, K. Busch, and C. M. Soukoulis, “Direct laser writing of three-dimensional photonic-crystal templates for telecommunications,” Nature Materials, vol. 3, pp. 444–447, 2004. View at Publisher · View at Google Scholar
  73. J. Fischer and M. Wegener, “Three-dimensional direct laser writing inspired by stimulated-emission-depletion microscopy,” Optical Materials Express, vol. 1, no. 4, pp. 614–624, 2011. View at Publisher · View at Google Scholar
  74. E. Palacios, L. E. Ocola, A. Joshi-Imre, S. Bauerdick, M. Berse, and L. Peto, “Three-dimensional microfluidic mixers using ion beam lithography and micromachining,” Journal of Vacuum Science & Technology B, vol. 28, no. 6, p. C611, 2010. View at Publisher · View at Google Scholar · View at Scopus
  75. G. Lalev, P. Petkov, N. Sykes et al., “Fabrication and validation of fused silica NIL templates incorporating different length scale features,” Microelectronic Engineering, vol. 86, no. 4–6, pp. 705–708, 2009. View at Publisher · View at Google Scholar · View at Scopus
  76. J. Kettle, R. T. Hoyle, R. M. Perks, and S. Dimov, “Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications,” Journal of Vacuum Science & Technology B, vol. 26, no. 5, pp. 1794–1799, 2008. View at Publisher · View at Google Scholar · View at Scopus
  77. J. Taniguchi, K. Koga, Y. Kogo, and I. Miyamoto, “Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography,” Microelectronic Engineering, vol. 83, no. 4–9, pp. 940–943, 2006. View at Publisher · View at Google Scholar · View at Scopus
  78. J. Edel and T. Albrecht, Nanopores for Bioanalytical Applications: Proceedings of the International Conference, The Royal Society of Chemistry Publishing, London, UK, 2012.
  79. C. Dekker, “Solid-state nanopores,” Nature Nanotechnology, vol. 2, no. 4, pp. 209–215, 2007. View at Publisher · View at Google Scholar · View at Scopus
  80. K. Healy, B. Schiedt, and I. P. Morrison, “Solid-state nanopore technologies for nanopore-based DNA analysis,” Nanomedicine, vol. 2, no. 6, pp. 875–897, 2007. View at Publisher · View at Google Scholar · View at Scopus
  81. R. Mulero, A. S. Prabhu, K. J. Freedman, and M. J. Kim, “Nanopore-based devices for bioanalytical applications,” Journal of Laboratory Automation, vol. 15, no. 3, pp. 243–252, 2010. View at Publisher · View at Google Scholar · View at Scopus
  82. D. Japrung, J. Dogan, K. J. Freedman, A. Nadzeyka, and S. Bauerdick, “Single-molecule studies of intrinsic disordered proteins using solid-state nanopores,” Analytical Chemistry, vol. 85, no. 4, pp. 2449–2456, 2013. View at Publisher · View at Google Scholar
  83. A. L. Lattes, S. C. Munroe, M. M. Seaver, J. E. Murguia, and J. Melngailis, “Improved drift in two-phase, long-channel, shallow buried-channel CCDs with longitudinally nonuniform storage-gate implants,” IEEE Transactions on Electron Devices, vol. 39, no. 7, pp. 1772–1774, 1992. View at Publisher · View at Google Scholar · View at Scopus
  84. C.-C. Shen, J. Murguia, N. Goldsman, M. Peckerar, J. Melngailis, and D. A. Antoniadis, “Use of focused-ion-beam and modeling to optimize submicron MOSFET characteristics,” IEEE Transactions on Electron Devices, vol. 45, no. 2, pp. 453–459, 1998. View at Publisher · View at Google Scholar · View at Scopus
  85. R. M. Langford, P. M. Nellen, J. Gierak, and Y. Fu, “Focused ion beam micro- and nanoengineering,” Materials Research Society Bulletin, vol. 32, no. 5, pp. 417–423, 2007. View at Scopus
  86. A. J. De Marco and J. Melngailis, “Maskless fabrication of JFETs via focused ion beams,” Solid-State Electronics, vol. 48, no. 10-11, pp. 1833–1836, 2004. View at Publisher · View at Google Scholar · View at Scopus
  87. T. Shinada, S. Okamoto, T. Kobayashi, and I. Ohdomari, “Enhancing semiconductor device performance using ordered dopant arrays,” Nature, vol. 437, no. 7062, pp. 1128–1131, 2005. View at Publisher · View at Google Scholar · View at Scopus
  88. M. Hori, T. Shinada, K. Taira et al., “Performance enhancement of semiconductor devices by control of discrete dopant distribution,” Nanotechnology, vol. 20, no. 36, Article ID 365205, 2009. View at Publisher · View at Google Scholar · View at Scopus
  89. P. M. Koenraad and M. E. Flatté, “Single dopants in semiconductors,” Nature Materials, vol. 10, no. 2, pp. 91–100, 2011. View at Publisher · View at Google Scholar · View at Scopus
  90. J. C. McCallum, D. N. Jamieson, C. Yang et al., “Single-ion implantation for the development of Si-based MOSFET devices with quantum functionalities,” Advances in Materials Science and Engineering, vol. 2012, Article ID 272694, 10 pages, 2012. View at Publisher · View at Google Scholar · View at Scopus
  91. C. Meier, D. Reuter, C. Riedesel, and A. D. Wieck, “Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures,” Journal of Applied Physics, vol. 93, no. 10, pp. 6100–6106, 2003. View at Publisher · View at Google Scholar · View at Scopus
  92. D. G. Deppe and N. Holonyak Jr., “Atom diffusion and impurity-induced layer disordering in quantum well III-V semiconductor heterostructures,” Journal of Applied Physics, vol. 64, no. 12, pp. R93–R113, 1988. View at Publisher · View at Google Scholar · View at Scopus
  93. A. J. Steckl, P. Chen, H. E. Jackson et al., “Review of focused ion beam implantation mixing for the fabrication of GaAs-based optoelectronic devices,” Journal of Vacuum Science & Technology B, vol. 13, no. 6, pp. 2570–2575, 1995. View at Publisher · View at Google Scholar · View at Scopus
  94. H. König, N. Mais, E. Höfling et al., “Focused ion beam implantation for opto- and microelectronic devices,” Journal of Vacuum Science & Technology B, vol. 16, no. 4, pp. 2562–2566, 1998. View at Scopus
  95. J. P. Reithmaier and A. Forchel, “Focused ion-beam implantation induced thermal quantum-well intermixing for monolithic optoelectronic device integration,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 4, no. 4, pp. 595–605, 1998. View at Publisher · View at Google Scholar · View at Scopus
  96. V. Aimez, J. Beauvais, J. Beerens, D. Morris, H. S. Lim, and B.-S. Ooi, “Low-energy ion-implantation-induced quantum-well intermixing,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 8, no. 4, pp. 870–879, 2002. View at Publisher · View at Google Scholar · View at Scopus
  97. G. H. Waller, A. Stein, and J. T. Abiade, “Nanofabrication of doped, complex oxides,” Journal of Vacuum Science & Technology B, vol. 30, no. 1, Article ID 011804, 2012. View at Publisher · View at Google Scholar · View at Scopus
  98. I. Vrejoiu, M. Alexe, D. Hesse, and U. Gösele, “Functional perovskites—from epitaxial films to nanostructured arrays,” Advanced Functional Materials, vol. 18, no. 24, pp. 3892–3906, 2008. View at Publisher · View at Google Scholar · View at Scopus
  99. J. A. Klug, M. V. Holt, R. N. Premnath et al., “Elastic relaxation and correlation of local strain gradients with ferroelectric domains in (001) BiFeO3 nanostructures,” Applied Physics Letters, vol. 99, no. 5, Article ID 052902, 2011. View at Publisher · View at Google Scholar · View at Scopus
  100. S. Avci, Z. L. Xiao, J. Hua et al., “Matching effect and dynamic phases of vortex matter in Bi2Sr2CaCu2O8 nanoribbon with a periodic array of holes,” Applied Physics Letters, vol. 97, no. 4, Article ID 042511, 2010. View at Publisher · View at Google Scholar · View at Scopus
  101. M. L. Latimer, Z. L. Xiao, J. Hua, A. Joshi-Imre, and Y. L. Wang, “Anisotropy of the critical temperature of a superconducting niobium thin film with an array of nanoscale holes in an external magnetic field,” Physical Review B, vol. 87, no. 2, Article ID 020507, 2013. View at Publisher · View at Google Scholar
  102. E. S. Sadki, S. Ooi, and K. Hirata, “Focused-ion-beam-induced deposition of superconducting nanowires,” Applied Physics Letters, vol. 85, no. 25, pp. 6206–6208, 2004. View at Publisher · View at Google Scholar · View at Scopus
  103. J. C. Lodder, “Patterned Nanomagnetic Films,” in Advanced Magnetic Nanostructures, pp. 261–288, Springer, New York, NY, USA, 2006, ISBN 9780387233093.
  104. S. Khizroev and D. Litvinov, “Focused-ion-beam-based rapid prototyping of nanoscale magnetic devices,” Nanotechnology, vol. 15, no. 3, pp. R7–R15, 2004. View at Publisher · View at Google Scholar · View at Scopus
  105. A. Lapicki, K. Kang, and T. Suzuki, “Fabrication of magnetic dot arrays by ion beam induced chemical vapor deposition (IBICVD),” IEEE Transactions on Magnetics, vol. 38, no. 5, part 1, pp. 2589–2591, 2002. View at Publisher · View at Google Scholar · View at Scopus
  106. A. Lapicki, E. Ahmad, and T. Suzuki, “Ion beam induced chemical vapor deposition (IBICVD) of cobalt particles,” Journal of Magnetism and Magnetic Materials, vol. 240, no. 1–3, pp. 47–49, 2002. View at Publisher · View at Google Scholar
  107. Q. Y. Xu, Y. Kageyama, and T. Suzuki, “Ion-beam-induced chemical-vapor deposition of FePt and CoPt particles,” Journal of Applied Physics, vol. 97, no. 10, Article ID 10K308, 2005. View at Publisher · View at Google Scholar · View at Scopus
  108. J. Fassbender and J. McCord, “Magnetic patterning by means of ion irradiation and implantation,” Journal of Magnetism and Magnetic Materials, vol. 320, no. 3-4, pp. 579–596, 2008. View at Publisher · View at Google Scholar · View at Scopus
  109. M. G. Blaber, M. D. Arnold, and M. J. Ford, “A review of the optical properties of alloys and intermetallics for plasmonics,” Journal of Physics, vol. 22, no. 14, p. 143201, 2010. View at Publisher · View at Google Scholar · View at Scopus
  110. W. L. Barnes, A. Dereux, and T. W. Ebbesen, “Surface plasmon subwavelength optics,” Nature, vol. 424, no. 6950, pp. 824–830, 2003. View at Publisher · View at Google Scholar · View at Scopus
  111. W. A. Murray and W. L. Barnes, “Plasmonic materials,” Advanced Materials, vol. 19, no. 22, pp. 3771–3782, 2007. View at Publisher · View at Google Scholar · View at Scopus
  112. Y. Fu, F. Fang, and Z. Xu, “Nanofabrication and characterization of plasmonic structures,” in Nanofabrication, Y. Masuda, Ed., chapter 9, InTech, Rijeka, Croatia, 2011. View at Publisher · View at Google Scholar
  113. J. T. Bahns, A. Imre, V. K. Vlasko-Vlasov et al., “Enhanced Raman scattering from focused surface plasmons,” Applied Physics Letters, vol. 91, no. 8, Article ID 081104, 2007. View at Publisher · View at Google Scholar · View at Scopus
  114. L. Rosa, K. Sun, V. Mizeikis, S. Bauerdick, L. Peto, and S. Juodkazis, “3D-tailored gold nanoparticles for light field enhancement and harvesting over visible-IR spectral range,” Journal of Physical Chemistry C, vol. 115, no. 13, pp. 5251–5256, 2011. View at Publisher · View at Google Scholar · View at Scopus
  115. I. Chyr and A. J. Steckl, “Focused ion beam micromachining of GaN photonic devices,” Materials Research Society Proceedings, vol. 537, article G10.7, 1999. View at Publisher · View at Google Scholar
  116. N. A. Paraire, P. G. Filloux, and K. Wang, “Patterning and characterization of 2D photonic crystals fabricated by focused ion beam etching of multilayer membranes,” Nanotechnology, vol. 15, no. 3, pp. 341–346, 2004. View at Publisher · View at Google Scholar · View at Scopus
  117. D. Freeman, S. Madden, and B. Luther-Davies, “Fabrication of planar photonic crystals in a chalcogenide glass using a focused ion beam,” Optics Express, vol. 13, no. 8, pp. 3079–3086, 2005. View at Publisher · View at Google Scholar · View at Scopus
  118. Y. K. Kim, A. J. Danner, J. J. Raftery, and K. D. Choquette, “Focused ion beam nanopatterning for optoelectronic device fabrication,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 11, no. 6, pp. 1292–1297, 2005. View at Publisher · View at Google Scholar · View at Scopus
  119. M. J. Cryan, M. Hill, D. C. Sanz et al., “Focused ion beam-based fabrication of nanostructured photonic devices,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 11, no. 6, pp. 1266–1276, 2005. View at Publisher · View at Google Scholar · View at Scopus
  120. S. Cabrini, L. Businaro, M. Prasciolu et al., “Focused ion beam fabrication of one-dimensional photonic crystals on Si3N4/SiO2 channel waveguides,” Journal of Optics A, vol. 8, no. 7, pp. S550–S553, 2006. View at Publisher · View at Google Scholar · View at Scopus
  121. W. C. L. Hopman, F. Ay, W. Hu et al., “Focused ion beam scan routine, dwell time and dose optimizations for submicrometre period planar photonic crystal components and stamps in silicon,” Nanotechnology, vol. 18, no. 19, Article ID 195305, 2007. View at Publisher · View at Google Scholar · View at Scopus
  122. F. Ay, I. Iñurrategui, D. Geskus, S. Aravazhi, and M. Pollnau, “Integrated lasers in crystalline double tungstates with focused-ion-beam nanostructured photonic cavities,” Laser Physics Letters, vol. 8, no. 6, pp. 423–430, 2011. View at Publisher · View at Google Scholar · View at Scopus
  123. F. Ay, K. Wörhoff, and R. M. de Ridder, “Focused-ion-beam nanostructuring of AI2O3 dielectric layers for photonic applications,” Journal of Micromechanics and Microengineering, vol. 22, no. 10, Article ID 105008, 2012. View at Publisher · View at Google Scholar
  124. S. Juodkazis, L. Rosa, S. Bauerdick, L. Peto, R. El-Ganainy, and S. John, “Sculpturing of photonic crystals by ion beam lithography: towards complete photonic bandgap at visible wavelengths,” Optics Express, vol. 19, no. 7, pp. 5802–5810, 2011. View at Publisher · View at Google Scholar · View at Scopus
  125. Y.-Q. Fu, N. Kok, and A. Bryan, “Microfabrication of microlens array by focused ion beam technology,” Microelectronic Engineering, vol. 54, no. 3-4, pp. 211–221, 2000. View at Publisher · View at Google Scholar · View at Scopus
  126. T. M. Babinec, J. T. Choy, K. J. M. Smith, M. Khan, and M. Lončar, “Design and focused ion beam fabrication of single crystal diamond nanobeam cavities,” Journal of Vacuum Science & Technology B, vol. 29, no. 1, Article ID 010601, 2011. View at Publisher · View at Google Scholar · View at Scopus
  127. I. Bayn, B. Meyler, A. Lahav et al., “Processing of photonic crystal nanocavity for quantum information in diamond,” Diamond and Related Materials, vol. 20, no. 7, pp. 937–943, 2011. View at Publisher · View at Google Scholar · View at Scopus
  128. A. D. Greentree, B. A. Fairchild, F. M. Hossain, and S. Prawer, “Diamond integrated quantum photonics,” Materials Today, vol. 11, no. 9, pp. 22–31, 2008. View at Publisher · View at Google Scholar
  129. H.-H. Tao, R. Cheng, F. Shuai, and Z.-Y. Li, “Optical improvement of photonic devices fabricated by Ga+ focused ion beam micromachining,” Journal of Vacuum Science & Technology B, vol. 25, no. 5, pp. 1609–1614, 2007. View at Publisher · View at Google Scholar
  130. J. Schrauwen, F. Van Laere, D. Van Thourhout, and R. Baets, “Focused-ion-beam fabrication of slanted grating couplers in silicon-on-insulator waveguides,” IEEE Photonics Technology Letters, vol. 19, no. 11, pp. 816–818, 2007. View at Publisher · View at Google Scholar · View at Scopus
  131. F. Schiappelli, R. Kumar, M. Prasciolu et al., “Efficient fiber-to-waveguide coupling by a lens on the end of the optical fiber fabricated by focused ion beam milling,” Microelectronic Engineering, vol. 73-74, pp. 397–404, 2004. View at Publisher · View at Google Scholar · View at Scopus
  132. W. Yuan, F. Wang, and O. Bang, “Optical fiber sensors fabricated by the focused ion beam technique,” in 22nd International Conference on Optical Fiber Sensors, vol. 8421 of Proceedings of SPIE, Beijing, China, October 2012. View at Publisher · View at Google Scholar
  133. J. Huang, A. Alqahtani, J. Viegas, and M. S. Dahlem, “Fabrication of optical fiber gratings through focused ion beam techniques for sensing applications,” in Proceedings of the Photonics Global Conference (PGC '12), pp. 1–4, Singapore, December 2012. View at Publisher · View at Google Scholar
  134. K. Keskinbora, C. Grévent, M. Bechtel, M. Weigand, and E. Goering, “Ion beam lithography for Fresnel zone plates in X-ray microscopy,” Optics Express, vol. 21, no. 10, pp. 11747–11756, 2013. View at Publisher · View at Google Scholar
  135. A. Nadzeyka, L. Petoa, S. Bauerdick, et al., “Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes,” Microelectronic Engineering, vol. 98, pp. 198–201, 2012. View at Publisher · View at Google Scholar
  136. P. P. Ilinski, B. P. Lai, N. J. Bassom, J. Donald, and G. J. Athas, “X-ray zone plate fabrication using a focused ion beam,” in Advances in X-Ray Optics, vol. 4145 of Proceedings of SPIE, pp. 311–316, The International Society for Optical Engineering, San Diego, Calif, USA, July 2000. View at Publisher · View at Google Scholar · View at Scopus
  137. C.-Y. Lee, C.-L. Chang, Y.-N. Wang, and L.-M. Fu, “Microfluidic mixing: a review,” International Journal of Molecular Sciences, vol. 12, no. 5, pp. 3263–3287, 2011. View at Publisher · View at Google Scholar · View at Scopus
  138. Y. K. Suh and S. Kang, “A review on Mixing in Microfluidics,” Micromachines, vol. 1, no. 3, pp. 82–111, 2010. View at Publisher · View at Google Scholar
  139. L. Capretto, W. Cheng, M. Hill, and X. Zhang, “Micromixing within microfluidic devices,” Topics in Current Chemistry, vol. 304, pp. 27–68, 2011. View at Publisher · View at Google Scholar · View at Scopus
  140. J. H. Daniel, D. F. Moore, and J. F. Walker, “Focused ion beams for microfabrication,” Engineering Science and Education Journal, vol. 7, no. 2, pp. 53–56, 1998. View at Scopus
  141. S. Reyntjens and R. Puers, “A review of focused ion beam applications in microsystem technology,” Journal of Micromechanics and Microengineering, vol. 11, no. 4, pp. 287–300, 2001. View at Publisher · View at Google Scholar · View at Scopus
  142. M. J. Vasile, D. Grigg, J. E. Griffith, E. Fitzgerald, and P. E. Russell, “Scanning probe tip geometry optimized for metrology by focused ion beam ion milling,” Journal of Vacuum Science & Technology B, vol. 9, no. 6, p. 3569, 1991. View at Publisher · View at Google Scholar
  143. B. G. Konoplev, O. A. Ageev, V. A. Smirnov, A. S. Kolomiitsev, and N. I. Serbu , “Probe modification for scanning probe microscopy by the focused ion beam method,” Russian Microelectronics, vol. 41, no. 1, pp. 41–50, 2012. View at Publisher · View at Google Scholar
  144. L. Gao, L. P. Yue, T. Yokota et al., “Focused ion beam milled CoPt magnetic force microscopy tips for high resolution domain images,” IEEE Transactions on Magnetics, vol. 40, no. 4, pp. 2194–2196, 2004. View at Publisher · View at Google Scholar · View at Scopus
  145. K. Akiyama, T. Eguchi, T. An, Y. Fujikawa, T. Sakurai, and Y. Hasegawa, “Functional probes for scanning probe microscopy,” Journal of Physics, vol. 61, no. 1, article 5, pp. 22–25, 2007. View at Publisher · View at Google Scholar · View at Scopus
  146. S. Pilevar, K. Edinger, W. Atia, I. Smolyaninov, and C. Davis, “Focused ion-beam fabrication of fiber probes with well-defined apertures for use in near-field scanning optical microscopy,” Applied Physics Letters, vol. 72, no. 24, pp. 3133–3135, 1998. View at Publisher · View at Google Scholar · View at Scopus
  147. E. X. Jin and X. Xu, “Focussed ion beam machined cantilever aperture probes for near-field optical imaging,” Journal of Microscopy, vol. 229, no. 3, pp. 503–511, 2008. View at Publisher · View at Google Scholar · View at Scopus
  148. A. Avdic, A. Lugstein, M. Wu et al., “Fabrication of cone-shaped boron doped diamond and gold nanoelectrodes for AFM-SECM,” Nanotechnology, vol. 22, no. 14, Article ID 145306, 2011. View at Publisher · View at Google Scholar · View at Scopus
  149. D. J. Comstock, J. W. Elam, M. J. Pellin, and M. C. Hersam, “Integrated ultramicroelectrode-nanopipet probe for concurrent scanning electrochemical microscopy and scanning Ion conductance microscopy,” Analytical Chemistry, vol. 82, no. 4, pp. 1270–1276, 2010. View at Publisher · View at Google Scholar · View at Scopus
  150. C. Menozzi, L. Calabri, P. Facci, P. Pingue, F. Dinelli, and P. Baschieri, “Focused ion beam as tool for atomic force microscope (AFM) probes sculpturing,” Journal of Physics, vol. 126, Article ID 012070, 2008. View at Publisher · View at Google Scholar · View at Scopus
  151. X. Wang, L. Vincent, D. Bullen, J. Zou, and C. Liu, “Scanning probe lithography tips with spring-on-tip designs: analysis, fabrication, and testing,” Applied Physics Letters, vol. 87, no. 5, Article ID 054102, 2005. View at Publisher · View at Google Scholar · View at Scopus
  152. G. Villanueva, J. A. Plaza, A. Sánchez-Amores et al., “Deep reactive ion etching and focused ion beam combination for nanotip fabrication,” Materials Science and Engineering C, vol. 26, no. 2-3, pp. 164–168, 2006. View at Publisher · View at Google Scholar · View at Scopus
  153. R. M. Langford, “Focused ion beams techniques for nanomaterials characterization,” Microscopy Research and Technique, vol. 69, no. 7, pp. 538–549, 2006. View at Publisher · View at Google Scholar · View at Scopus
  154. J. Mayer, L. A. Giannuzzi, T. Kamino, and J. Michael, “TEM sample preparation and FIB-induced damage,” Materials Research Society Bulletin, vol. 32, no. 5, pp. 400–407, 2007. View at Publisher · View at Google Scholar · View at Scopus
  155. M. D. Uchic, L. Holzer, B. J. Inkson, E. L. Principe, and P. Munroe, “Three-dimensional microstructural characterization using focused ion beam tomography,” Materials Research Society Bulletin, vol. 32, no. 5, pp. 408–416, 2007. View at Scopus
  156. Y. N. Picard, D. P. Adams, M. J. Vasile, and M. B. Ritchey, “Focused ion beam-shaped microtools for ultra-precision machining of cylindrical components,” Precision Engineering, vol. 27, no. 1, pp. 59–69, 2003. View at Publisher · View at Google Scholar · View at Scopus
  157. M. J. Vasile, R. Nassar, J. Xie, and H. Guo, “Microfabrication techniques using focused ion beams and emergent applications,” Micron, vol. 30, no. 3, pp. 235–244, 1999. View at Publisher · View at Google Scholar · View at Scopus
  158. A. Yasaka, F. Aramaki, M. Muramatsu et al., “Application of vector scanning in focused ion beam photomask repair system,” Journal of Vacuum Science & Technology B, vol. 26, no. 6, pp. 2127–2130, 2008. View at Publisher · View at Google Scholar · View at Scopus
  159. C. Boit, R. Schlangen, U. Kerst, and T. Lundquist, “Physical techniques for chip-backside IC debug in nanotechnologies,” IEEE Design & Test of Computers, vol. 25, no. 3, pp. 250–257, 2008. View at Publisher · View at Google Scholar · View at Scopus
  160. G. J. Athas, K. E. Noll, R. Mello et al., “Focused ion beam system for automated MEMS prototyping and processing,” in Micromachining and Microfabrication Process Technology III, vol. 3223 of Proceedings of SPIE, pp. 198–207, Austin, Tex, USA, September 1997. View at Publisher · View at Google Scholar · View at Scopus
  161. T. Koshikawa, A. Nagai, Y. Yokoyama, and T. Hoshino, “A new write head trimmed at wafer level by focused ion beam,” IEEE Transactions on Magnetics, vol. 34, no. 4, pp. 1471–1473, 1998. View at Publisher · View at Google Scholar · View at Scopus
  162. S. Khizroev, Y. Liu, K. Mountfield, M. H. Kryder, and D. Litvinov, “Physics of perpendicular magnetic recording: writing process,” Journal of Magnetism and Magnetic Materials, vol. 246, no. 1-2, pp. 335–344, 2002. View at Publisher · View at Google Scholar · View at Scopus
  163. P. Mazarov, A. D. Wieck, L. Bischoff, and W. Pilz, “Alloy liquid metal ion source for carbon focused ion beams,” Journal of Vacuum Science & Technology B, vol. 27, no. 6, pp. L47–L49, 2009. View at Publisher · View at Google Scholar · View at Scopus
  164. O. Wilhelmi, S. Reyntjens, C. Mitterbauer, L. Roussel, D. J. Stokes, and D. H. W. Hubert, “Rapid prototyping of nanostructured materials with a focused ion beam,” Japanese Journal of Applied Physics, vol. 47, no. 6, pp. 5010–5014, 2008. View at Publisher · View at Google Scholar · View at Scopus
  165. D. J. Stokes, T. Vystavel, and F. Morrissey, “Focused ion beam (FIB) milling of electrically insulating specimens using simultaneous primary electron and ion beam irradiation,” Journal of Physics D, vol. 40, no. 3, article 028, pp. 874–877, 2007. View at Publisher · View at Google Scholar · View at Scopus