Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process

<table class="figure-group"><tr class="fig-image" id="a"><td><object data="https://static.hindawi.com/articles/jnt/volume-2016/1963847/figures/1963847.fig.003a.svgz" name="1963847.fig.003a" type="image/svg+xml"></object></td></tr><tr class="fig-caption"><td><b>(a) </b>Common morphology</td></tr><tr class="fig-image" id="b"><td><object data="https://static.hindawi.com/articles/jnt/volume-2016/1963847/figures/1963847.fig.003b.svgz" name="1963847.fig.003b" type="image/svg+xml"></object></td></tr><tr class="fig-caption"><td><b>(b) </b>Large particles hard to find</td></tr></table>

<div>TEM morphology of SiO<sub>2</sub> particles (80 kW, 10 g/min, and 9 cm).</div>

Journal of Nanotechnology

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Figure 3

Figure 3: Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process 