Amorphous Silicon-Germanium Films with Embedded Nanocrystals for Thermal Detectors with Very High Sensitivity

Table 1

Deposition conditions of two series of pm-:H thin films prepared by PECVD.

	Sample number	Temperature °C	Pressure mTorr	SiH4 sccm	GeH4 sccm	H2 sccm
	P11		500
Series #1	P12		1000	50	50	110
	P13	200°C	1200
	P21		500
Series #2	P22		1000	90	10	110
	P23		1200