Design and Fabrication of Slotted Multimode Interference Devices for Chemical and Biological Sensing

Figure 10

Fabrication process of slotted MMI sensor.

(a) Growth SiON layer by PECVD.

(b) Deposition of chromium layer by PVD.

(c) Photolithography.

(d) Develop photoresist.

(e) Chromium RIE.

(f) SiON layer RIE.

(g) Wet chromium etch.