Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer

Figure 1

(a) A thin oxide layer (navy) formed on silicon surface (light blue) by oxygen plasma. (b) Dispersed oxide nanomask formed by etching thin oxide layer with CHF₃ plasma. (c) Nanocones etched by mixture plasma of Cl₂ and Ar (10 : 1). (d) Nanocone structure after silicon oxide removal by BOE. (e) SEM picture corresponding to (c). (f) SEM picture corresponding to (d).

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