Effect of Oxygen Partial Pressure on the Electrical and Optical Properties of DC Magnetron Sputtered Amorphous TiO₂ Films

Table 1

Deposition conditions maintained during the preparation of TiO₂ films.

Sputter target	Titanium target (99.9% pure)
Target to substrate distance	80 mm
Ultimate pressure	2 × 10^−4 Pa
Oxygen partial pressure	9 × 10^−3–9 × 10^−2 Pa
Sputter pressure	0.5 Pa
Substrate temperature	303 K
Sputter power	200 W