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Journal of Spectroscopy
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Journal of Spectroscopy
/
2013
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Article
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Tab 1
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Research Article
Effect of Oxygen Partial Pressure on the Electrical and Optical Properties of DC Magnetron Sputtered Amorphous
Films
Table 1
Deposition conditions maintained during the preparation of TiO
2
films.
Sputter target
Titanium target (99.9% pure)
Target to substrate distance
80 mm
Ultimate pressure
2 × 10
−4
Pa
Oxygen partial pressure
9 × 10
−3
–9 × 10
−2
Pa
Sputter pressure
0.5 Pa
Substrate temperature
303 K
Sputter power
200 W