Chemical and Physical Changes Induced in Optical Materials under High-Intensity Laser Irradiation
Call for Papers
The special issue announced in the Laser Chemistry journal aims towards the presentation of original contributions on the field of “interaction and processing of optical materials under high-intensity laser irradiation”. The benefits emerging from the use of high- power lasers for processing functional photonic devices and optical components have boosted the interest in the physical processes involved in the interaction between intense laser radiation with transparent optical materials. Broad scientific areas include (but are not limited to):
- Photosensitivity of optical materials
- Index engineering in optical fibres and bulk materials
- Underlying physical processes
- Materials and codopands
- Photosensitivity enhancement approaches
- Femtosecond laser processing of optical materials
- In-volume damage processes and products
- Filamentation effects
- Extreme structural changes
- Laser-Induced chemical processes in optical materials
- Hydrogenated silica
- Nanocomposites formation and migration effects
- Processing methods and applications
- Photonics
- Bio-related applications
- Nonablative structuring processes
- Surface functionalisation
Authors should follow the Laser Chemistry manuscript format described at http://www.hindawi.com/journals/lc/. Prospective authors should submit an electronic copy of their complete manuscript through the Laser Chemistry Manuscript Tracking System at http://mts.hindawi.com/, according to the following timetable:
| Manuscript Due | May 1, 2008 |
| First Round of Reviews | August 1, 2008 |
| Publication Date | November 1, 2008 |
Guest Editors
- Stavros Pissadakis, Institute of Electronic Structure and Laser (IESL), Foundation for Research and Technology - Hellas (FORTH), P.O. Box 1527, Heraklion 71 110, Greece
- Jacques Albert, Department of Electronics, Carleton University, 1125 Colonel By Drive, Ottawa, ON, Canada K1S 5B6
- Saulius Juodkazis, Research Institute for Electronic Science, Hokkaido University, North 21 - West 10, CRIS Bldg., Sapporo 001-0021, Japan