Editorial Board

• Ali M. Adawi, University of Hull, United Kingdom
• Tae Jung Ahn, Chosun University, Korea
• Alexander Andreev, Max-Born-Institute, Germany
• Jintao Bai, Northwest University, China
• Jose Manuel Baptista, Universidade da Madeira, Portugal
• Jörn Bonse, BAM Federal Institute for Materials Research and Testing, Germany
• Jorge Bravo-Abad, Universidad Autónoma de Madrid, Spain
• Aldo Brugnera, Camilo Castelo Branco University, Brazil
• Zenghu Chang, University of Central Florida, USA
• Sebastien Chenais, Universite Paris 13, France
• David T. Crouse, The City University of New York, USA
• Narendra B. Dahotre, University of North Texas, USA
• Philippe Delaporte, Les Universités à Aix en Provence, France
• Samuel Dupont, Université de Valenciennes, France
• Ihab F. El-Kady, Sandia National Laboratories, USA
• Qiyin Fang, McMaster University, Canada
• Xinhuan Feng, Jinan University, China
• Marian Florescu, University of Surrey, United Kingdom
• Takao Fuji, Institute for Molecular Science, Japan
• Keith Goossen, The University of Delaware, USA
• Fabrice Gourbilleau, Ecole Nationale Supérieure des Ingénieurs de Caen, France
• Amit Goyal, Oak Ridge National Laboratory, USA
• Ming Han, University of Nebraska–Lincoln, USA
• Haroldo Hattori, The University of New South Wales at Canberra, Australia
• Christoph P. Hauri, Paul Scherrer Institute, France
• Eiji Higurashi, The University of Tokyo, Japan
• Bixue Hou, University of Michigan, USA
• Agostino Iadicicco, University of Naples Parthenope, Italy
• Baldemar Ibarra-Escamilla, Instituto Nacional de Astrofísica, Mexico
• Aju Jugessur, University of Iowa, USA
• Shingo Kanehira, Kyoto University, Japan
• Sunil K. Khijwania, Education and Research Network - ERNET India, India
• Detlef Kip, Helmut Schmidt University, Germany
• Nobuyoshi Koshida, Tokyo University of Agriculture and Technology, Japan
• Jörg Krüger, BAM Bundesanstalt für Materialforschung und - Prüfung, Germany
• Wan Kuang, Boise State University, USA
• Patrick Kung, The University of Alabama, USA
• Ngoc Diep Lai, École Normale Supérieure de Cachan, France
• Pascal Landais, Dublin City University, Ireland
• Gilles Lerondel, Université de technologie de Troyes, France
• Yuelin Li, Argonne National Laboratory, USA
• Baolai Liang, University of California, Los Angeles, USA
• Di Liang, Hewlett Packard Laboratories, USA
• Xuejun Lu, University of Massachusetts Lowell, USA
• Anatole Lupu, Université Paris-Sud, France
• Jorge Diego Marconi, CECS Universidade Federal do ABC, Brazil
• Luciano Mescia, Politecnico di Bari, Italy
• Kenta Miura, Gunma University, Japan
• Babak Momeni, Fred Hutchinson Cancer Research Center, USA
• Ivan Moreno, Univ. Autonoma de Zacatecas, Mexico
• Bülend Ortaç, Bilkent University, Turkey
• Chandra Kumar N. Patel, Pranalytica, Inc., USA
• Peng-Chun Peng, National Taipei University of Technology, Taiwan
• Gary R. Pickrell, Virginia Polytechnic Institute and State University, USA
• Gerd Priebe, Max-Born-Institute, Germany
• Roberto Proietti, University of California, Davis, USA
• Jessica Ramella-Roman, The Catholic University of America, USA
• Ammar Sharaiha, Ecole Nationale D'Ingenieurs de Brest, France
• Mathias Siebold, Helmholtz Zentrum Dresden-Rossendorf, Germany
• Ravindra Kumar Sinha, Delhi Technological University, India
• Luigi Sirleto, Consiglio Nazionale delle Ricerche, Italy
• Vaidyanathan Sivakumar, National Institute of Technology, India
• Takenobu Suzuki, Toyota Technological Institute, Japan
• Vincent J. Urick, U.S. Naval Research Laboratory, USA
• Shailendra Kumar Varshney, Indian Institute of Technology, India
• Gregory Vieux, University of Strathclyde, United Kingdom
• Carsten Wochnowski, Deutsches Patent- und Markenamt (German Patent and Trademark Office), Germany
• Marc Wuilpart, Université de Mons, Belgium
• Ruidong Xia, Imperial College London, United Kingdom
• Jian Xu, Pennsylvania State University, USA
• Jianqiu Xu, Shanghai Jiaotong University, China
• Xianbin Yu, Technical University of Denmark, Denmark
• Weili Zhang, Oklahoma State University, USA
• Jing Yuan Zhang, Georgia Southern University, USA
• Luming Zhao, Jiangsu Normal University, China
• Weimin Zhou, Shanghai Nanotechnology Promotion Center, China
• Weiwen Zou, Shanghai Jiao Tong University, China